RASIRC is a leading provider of dynamic gas generation solutions for next-generation semiconductor processes. Their innovative products convert low vapor-pressure liquid chemistries into safer and reliable gases, enabling the generation of thin oxide and nitride films at reduced temperatures. These films are crucial for the development of complex 3D structures in advanced microprocessors, memory, and III-V nitride devices.
RASIRC's product lineup includes BRUTE Hydrazine, which converts liquid hydrazine into pure and dry hydrazine gas, ideal for low-temperature nitride ALD. They also offer BRUTE Peroxide, a versatile solution for surface functionalization and area selective deposition. Additionally, RASIRC provides the Peroxidizer, which converts liquid hydrogen peroxide into gas for various applications, and the RainMaker Humidification System RHS, which converts water into particle-free water vapor for oxidation and annealing processes.
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